Semiconductor

💻 Semiconductor Process Chamber Components

Large diameter rings, liner shields, focus rings, clamp rings, gas distribution plates — thin-wall, high-purity

3 Components 1 Materials 3 Processes 3 Standards

What is Semiconductor Process Chamber Components?

💻 Semiconductor Process Chamber Components represents a complete system of precision titanium components engineered for Semiconductor applications. Large diameter rings, liner shields, focus rings, clamp rings, gas distribution plates — thin-wall, high-purity The system integrates 3 distinct component types manufactured through 3 specialized processes.

Key manufacturing processes for this system include Cleanroom CNC Class 100 for ion implant geometry, Electropolish Ra <0.25um with SPC sampling, UHP DI water cascade rinse with SPC sampling, Particle count MIL-STD-1246 with SPC sampling, Cleanroom CNC Class 100 for lithography geometry, each selected and qualified to meet component-specific requirements.

Engineering & Design Principles

Material: Grade 2 (CP-Ti) is preferred for chamber components due to its low sputter yield and minimal particle generation in plasma environments. Grade 5 for structural rings.

Form: Plate stock for large diameter rings and shields. Tube for gas distribution lines. Bar for fasteners.

Standards & Material Specifications

Standards: ASTM B265 Grade 2, double-melted (VAR), electropolished, Class 10 cleanroom packaged, particle count certified

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Engineering Solution Blueprint

Semiconductor Process Chamber Components

Semiconductor

1 Part Feature Analysis

Large diameter rings, liner shields, focus rings, clamp rings, gas distribution plates — thin-wall, high-purity

  • ⚠️ Plasma erosion
  • ⚠️ Particle generation
  • ⚠️ Metal contamination of wafers
  • ⚠️ Thermal uniformity
  • ⚠️ Cost of frequent replacement

2 Material Selection Rationale

Grade 2 CP-Ti — Industrial pure Ti, general corrosion resistance

Grade 2 (CP-Ti) is preferred for chamber components due to its low sputter yield and minimal particle generation in plasma environments. Grade 5 for structural rings.

3 Form Selection Rationale

Plate / Sheet — for welding, machined housings

Plate stock for large diameter rings and shields. Tube for gas distribution lines. Bar for fasteners.

4 Manufacturing Process & Services

Core Processes:

CNC turning/boring of ringsPrecision drilling of gas holesSurface treatment (anodizing)Ultra-sonic cleaning

Toll Processing Services:

Class 10 cleanroom packagingParticle count testingSurface roughness measurementHelium leak testing

Process Pitfalls:

  • ⚠️ Gas distribution hole diameter tolerance +-0.01mm required for uniform plasma
  • ⚠️ All surfaces must be electropolished to Ra<0.4um to minimize particle generation

5 Procurement Specifications

ASTM B265 Grade 2, double-melted (VAR), electropolished, Class 10 cleanroom packaged, particle count certified

Manufacturing Process Flow

1
CNC turning/boring of rings

CNC turning of titanium on multi-axis lathes produces cylindrical components with precision diameters and surface finishes. Live tooling enables milli

2
Precision drilling of gas holes

Laser drilling of titanium uses pulsed laser energy to create precise holes through percussion or trepanning methods. Hole diameters range from 0.05 m

3
Surface treatment (anodizing)

Titanium anodizing (AMS 2488) grows a controlled oxide layer through electrochemical conversion in an electrolyte bath. Type II produces interference

Components in This System

Component Material
Titanium Ion Implantation Electrode Grade 5 Ti-6Al-4V
Titanium Lithography Stage Flexure Grade 5 Ti-6Al-4V
Titanium Wafer Handling End-Effector Grade 5 Ti-6Al-4V

Frequently Asked Questions

What titanium grades are used in Semiconductor Process Chamber Components systems?
Semiconductor Process Chamber Components components are manufactured from Grade 5 Ti-6Al-4V. The specific grade is selected based on mechanical property requirements, corrosion resistance needs, and Semiconductor industry regulations.
What manufacturing processes are used for Semiconductor Process Chamber Components?
The Semiconductor Process Chamber Components system components are produced using Cleanroom CNC Class 100 for ion implant geometry, Electropolish Ra <0.25um with SPC sampling, UHP DI water cascade rinse with SPC sampling, Particle count MIL-STD-1246 with SPC sampling, Cleanroom CNC Class 100 for lithography geometry, Electropolish Ra <0.25um with Class 6g gauge. Each process is selected and qualified to meet the specific dimensional, metallurgical, and surface requirements of each component within the system.
What quality standards apply to Semiconductor Process Chamber Components components?
Semiconductor Process Chamber Components components are manufactured to SEMI F20 (ion extraction applied), SEMI F20 (monolithic flexure applied), SEMI F20 (robot endeffector applied) and other applicable specifications. Full material traceability, dimensional inspection reports, and certificates of conformance are provided with each shipment.
What industries use Semiconductor Process Chamber Components?
Semiconductor Process Chamber Components systems are deployed in Semiconductor applications. Each industry has specific regulatory and performance requirements that drive material selection and process qualification.
Can you provide DFM feedback for Semiconductor Process Chamber Components designs?
Yes. Our engineering team provides free Design for Manufacturability (DFM) analysis for Semiconductor Process Chamber Components projects. Upload your CAD file (STEP, DXF, or DWG format) and our team will review your design within 24 hours.

Engineering Trends

  • Process: CNC turning/boring of rings
  • Process: Precision drilling of gas holes
  • Process: Surface treatment (anodizing)

Related Manufacturing Capabilities

These specialized processes support Semiconductor Process Chamber Components component manufacturing.

About Boze Titanium Manufacturing Center

One Metal. One Focus. Infinite Precision.

Founded in 2011 in Baoji's Titanium Valley, BOZE Metal is dedicated exclusively to titanium — from raw material to precision engineering. AS9100D, ISO 13485 & ISO 9001 certified with 500+ clients across Aerospace, Medical & Motorsport industries, we deliver end-to-end precision titanium CNC machining with full material traceability from source to component.

Boze CNC Ti is the dedicated titanium manufacturing center of Baoji Boze Metal Products Co., Ltd.

AS9100D ISO 13485 ISO 9001 500+ Clients 15+ Years OEM/ODM