Titanium Ion Implantation Electrode is an ultra-clean ion extraction electrode component designed for Ion extraction electrode disk for implanter. Manufactured from Grade 5 Ti-6Al-4V with Class 100 cleanroom protocols, it provides the non-magnetic, low-outgassing, and particle-free performance essential for wafer fabrication environments.

Semiconductor / Ion Implant / SKU: TI-SEM-ION-IONIMP

Titanium Ion Implantation Electrode

MOQ 1 Unit
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Titanium Ion Implantation Electrode — Grade 5 Ti-6Al-4V Product Rendering
Also known as: Extraction electrodeIon diskBeam electrode
Technical Parameter Specification
Component SKU TI-SEM-ION-IONIMP
Standards & Specifications ASTM B348ISO 9001
Surface Finish Bead blasted matte Ra 1.6-3.2um + passivation
Ion Implant SKU: TI-SEM-ION-IONIMP

Titanium Ion Implantation Electrode

EN 10204 3.1REACHRoHS 3AS9100D
Material Grade: Grade 5 Ti-6Al-4V

Ion extraction electrode disk for implanter

Technical Specifications Matrix
Technical Parameter Specification Value
International Compliance ASTM B348, ISO 9001
Surface Finish & Max Temp Bead blasted matte Ra 1.6-3.2um + passivation
NDT & Quality Control Helium Mass Spectrometry Leak Detection per ASTM E493 (<1e-9 mbar·L/s); Particle Count Verification per SEMI E98 (Class 100); Surface Profilometry per ISO 4287 (Ra verification); Positive Material Identification (PMI) via XRF per ASTM E1476; Dimensional verification via CMM per ISO 10360
📜 Quality & Traceability Gate
  • 100% Traceability: Mill Test Certificate (EN 10204 3.1) with heat analysis & mechanical testing.
  • NDT Verification: Helium Mass Spectrometry Leak Detection per ASTM E493 (<1e-9 mbar·L/s); Particle Count Verification per SEMI E98 (Class 100); Surface Profilometry per ISO 4287 (Ra verification); Positive Material Identification (PMI) via XRF per ASTM E1476; Dimensional verification via CMM per ISO 10360.
  • Compliance: REACH, RoHS 3 certified. FAI AS9102 available.
⚙️ CNC & Stress Relief Controls
  • Process: CNC turning, heat treatment, surface grinding, passivation, dimensional check.
  • Thermal Stress Relief: Post-machining vacuum annealing (540-675°C under Argon) reduces distortion risk >70%.
  • Rolled Threads: Thread rolling (not cutting) increases fatigue limits by 30-50%.
Engineering FAQ
Q: Is Titanium Ion Implantation Electrode compatible with fluorine-based process chemistries?

Grade 5 Ti-6Al-4V has excellent resistance to NF₃, CF₄, SF₆, and other fluorine-based plasma chemistries used in semiconductor etching and chamber cleaning. The TiO₂ passive layer forms a stable TiF₄ reaction product that does not spall or generate particles. However, Titanium Ion Implantation Electrode should not be used in HF-containing wet processes where corrosion rates exceed 0.5 mm/year.

Q: What is the typical lead time for Titanium Ion Implantation Electrode orders?

Standard lead time for Titanium Ion Implantation Electrode is 15-25 business days depending on quantity and complexity. Rush orders (3-5 working days) are available for prototype evaluation. Sample evaluation (1-5 units) can be expedited to 5-7 business days. Volume pricing is available for production quantities above 100 units.

Q: What material certifications are provided with Titanium Ion Implantation Electrode?

Each Titanium Ion Implantation Electrode shipment includes EN 10204 Type 3.1 mill test certificate with chemical analysis, mechanical properties, and heat identification. Dimensional inspection reports and Certificate of Conformance (CoC) are standard. First Article Inspection Reports (FAIR) per AS9102 are available on request for ion extraction electrode.

Integration: Mechanical Subsystem A / Structural Carrier Assembly
Downstream: Mounting Bracket Kit / Threaded Insert Set / Torque Specification Tag
Engineering Report & Product Documentation

§ Grade 5 Ti-6Al-4V Selection for ion extraction electrode

Function

Engineered as a Ion Implant component, this part serves the specific function of . Grade 5 Ti-6Al-4V was selected for its proven performance in Semiconductor service conditions.

Specifications

  • SKU: TI-SEM-ION-IONIMP
  • Category: Ion Implant
  • Industry: Semiconductor
  • Material: Grade 5 Ti-6Al-4V
  • Process: CNC turning, heat treatment, surface grinding, passivation, dimensional check
  • Weight: 40% mass reduction vs standard steel components with same load rating

§ UHV Particle & Surface Contamination Verification

Quality Management

Quality system compliant with ISO 9001:2015. Each Titanium Ion Implantation Electrode batch includes full material traceability, dimensional inspection results, and a Certificate of Conformity (CoC).

Inspection & NDT

Vision-based optical inspection for surface defects; helium leak testing for sealed interfaces; eddy current surface crack detection on high-stress areas

§ Cleanroom Manufacturing & Finishing Process

Titanium Ion Implantation Electrode is manufactured using cnc turning, heat treatment, surface grinding, passivation, dimensional check. Each operation is performed by certified machinists with real-time process monitoring and dimensional verification at critical stages. Heat code traceability is maintained throughout all production steps.

Commercial Logistics & Procurement Framework

Minimum Order (MOQ) 1 Unit
Sample Evaluation 3-5 Business Days
Mass Production Lead 15-25 Business Days (Batch Dependent)
Shipping Basis EXW / FOB Shenzhen

Pricing and lead times for Titanium Ion Implantation Electrode are batch-dependent. Contact our supply chain team for volume-based tiered pricing.

Regulatory & Quality Assurance Ledger

Verifiable certifications for Titanium Ion Implantation Electrode

Material Test Certificate (MTC)

EN 10204 3.1

Verified

Environmental Compliance

REACH (EC No 1907/2006)

Verified

Restricted Substances

RoHS 3 Directive (2015/863/EU)

Verified

Quality Management System

AS9100D

Verified

Standard: ASTM B348

ASTM B348

Available upon Request

Standard: ISO 9001

ISO 9001

Available upon Request

Systems Interconnectivity & Topology

Cross-functional integration matrix for Tier-1 supply chains and assembly orchestration.

Upstream System Integration
  • Mechanical Subsystem A
  • Structural Carrier Assembly
Primary Inspected Component

Titanium Ion Implantation Electrode

Material: Grade 5 Ti-6Al-4V

SKU: TI-SEM-ION-IONIMP

Industry: Semiconductor / System: Semiconductor Process Chamber Components

Downstream Consumables
  • Mounting Bracket Kit
  • Threaded Insert Set
  • Torque Specification Tag

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About Boze Titanium Manufacturing Center

One Metal. One Focus. Infinite Precision.

Founded in 2011 in Baoji's Titanium Valley, BOZE Metal is dedicated exclusively to titanium — from raw material to precision engineering. AS9100D, ISO 13485 & ISO 9001 certified with 500+ clients across Aerospace, Medical & Motorsport industries, we deliver end-to-end precision titanium CNC machining with full material traceability from source to component.

Boze CNC Ti is the dedicated titanium manufacturing center of Baoji Boze Metal Products Co., Ltd.

AS9100D ISO 13485 ISO 9001 500+ Clients 15+ Years OEM/ODM