Titanium MOCVD Susceptor Support Arm is an ultra-clean wafer susceptor support component designed for Wafer susceptor support arm for MOCVD reactor. Manufactured from Grade 5 Ti-6Al-4V with Class 100 cleanroom protocols, it provides the non-magnetic, low-outgassing, and particle-free performance essential for wafer fabrication environments.
Titanium MOCVD Susceptor Support Arm
| Technical Parameter | Specification |
|---|---|
| Component SKU | TI-SEM-MOC-SUSCEP |
| Standards & Specifications | ISO 2768-mMIL-STD-810H |
| Surface Finish | Electropolishing Ra <0.4um + passivation |
Titanium MOCVD Susceptor Support Arm
Wafer susceptor support arm for MOCVD reactor
| Technical Parameter | Specification Value |
|---|---|
| International Compliance | ISO 2768-m, MIL-STD-810H |
| Surface Finish & Max Temp | Electropolishing Ra <0.4um + passivation |
| NDT & Quality Control | Helium Mass Spectrometry Leak Detection per ASTM E493 (<1e-9 mbar·L/s); Particle Count Verification per SEMI E98 (Class 100); Surface Profilometry per ISO 4287 (Ra verification); Positive Material Identification (PMI) via XRF per ASTM E1476; Dimensional verification via CMM per ISO 10360 |
- • 100% Traceability: Mill Test Certificate (EN 10204 3.1) with heat analysis & mechanical testing.
- • NDT Verification: Helium Mass Spectrometry Leak Detection per ASTM E493 (<1e-9 mbar·L/s); Particle Count Verification per SEMI E98 (Class 100); Surface Profilometry per ISO 4287 (Ra verification); Positive Material Identification (PMI) via XRF per ASTM E1476; Dimensional verification via CMM per ISO 10360.
- • Compliance: REACH, RoHS 3 certified. FAI AS9102 available.
- • Process: CNC milling, secondary deburring, bead blast finish, final CMM inspection.
- • Thermal Stress Relief: Post-machining vacuum annealing (540-675°C under Argon) reduces distortion risk >70%.
- • Rolled Threads: Thread rolling (not cutting) increases fatigue limits by 30-50%.
Q: What particle generation specifications apply to Titanium MOCVD Susceptor Support Arm? ▼
Titanium MOCVD Susceptor Support Arm is manufactured and cleaned to Class 100 cleanroom standards per ISO 14644-1. Surface particle count is verified to <0.1 particles/cm² at ≥0.3 µm size per SEMI M51. For wafer susceptor support in wafer handling, electropolished surfaces (Ra <0.25 µm) minimize particle trapping. DI water rinse + N₂ blow-dry final cleaning is standard.
Q: What is the typical lead time for Titanium MOCVD Susceptor Support Arm orders? ▼
Standard lead time for Titanium MOCVD Susceptor Support Arm is 15-25 business days depending on quantity and complexity. Rush orders (3-5 working days) are available for prototype evaluation. Sample evaluation (1-5 units) can be expedited to 5-7 business days. Volume pricing is available for production quantities above 100 units.
Q: What material certifications are provided with Titanium MOCVD Susceptor Support Arm? ▼
Each Titanium MOCVD Susceptor Support Arm shipment includes EN 10204 Type 3.1 mill test certificate with chemical analysis, mechanical properties, and heat identification. Dimensional inspection reports and Certificate of Conformance (CoC) are standard. First Article Inspection Reports (FAIR) per AS9102 are available on request for wafer susceptor support.
§ Grade 5 Ti-6Al-4V Selection for wafer susceptor support
Function
Engineered as a MOCVD component, this part serves the specific function of . Grade 5 Ti-6Al-4V was selected for its proven performance in Semiconductor service conditions.
Specifications
- SKU: TI-SEM-MOC-SUSCEP
- Category: MOCVD
- Industry: Semiconductor
- Material: Grade 5 Ti-6Al-4V
- Process: CNC milling, secondary deburring, bead blast finish, final CMM inspection
- Weight: Up to 55% weight savings compared to stainless steel alternatives
§ UHV Particle & Surface Contamination Verification
Quality Management
Manufactured to aerospace-grade quality standards with 100% material traceability. FAIR documentation available per AS9102 for Titanium MOCVD Susceptor Support Arm production lots.
Inspection & NDT
Coordinate measuring machine (CMM) full geometry verification; dye penetrant inspection (DPI) per ASTM E1417; spectroscopic alloy verification per ASTM E1476
§ Cleanroom Manufacturing & Finishing Process
Titanium MOCVD Susceptor Support Arm is manufactured using cnc milling, secondary deburring, bead blast finish, final cmm inspection. Each operation is performed by certified machinists with real-time process monitoring and dimensional verification at critical stages. Heat code traceability is maintained throughout all production steps.
Commercial Logistics & Procurement Framework
Pricing and lead times for Titanium MOCVD Susceptor Support Arm are batch-dependent. Contact our supply chain team for volume-based tiered pricing.
Regulatory & Quality Assurance Ledger
Verifiable certifications for Titanium MOCVD Susceptor Support Arm
Material Test Certificate (MTC)
EN 10204 3.1
Environmental Compliance
REACH (EC No 1907/2006)
Restricted Substances
RoHS 3 Directive (2015/863/EU)
Quality Management System
AS9100D
Dimensional Tolerances
ISO 2768-m
Standard: MIL-STD-810H
MIL-STD-810H
Systems Interconnectivity & Topology
Cross-functional integration matrix for Tier-1 supply chains and assembly orchestration.
- ▸ Device Enclosure Subassembly
- ▸ Internal Frame Structure
Titanium MOCVD Susceptor Support Arm
Material: Grade 5 Ti-6Al-4V
SKU: TI-SEM-MOC-SUSCEP
Industry: Semiconductor / System: MOCVD Wafer Susceptor & Support Hardware
- ▸ Assembly Hardware Pack
- ▸ Alignment Dowel Set
- ▸ Locking Mechanism
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Founded in 2011 in Baoji's Titanium Valley, BOZE Metal is dedicated exclusively to titanium — from raw material to precision engineering. AS9100D, ISO 13485 & ISO 9001 certified with 500+ clients across Aerospace, Medical & Motorsport industries, we deliver end-to-end precision titanium CNC machining with full material traceability from source to component.
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